[1]武频[],孙建城[],张慧茹[]. 基于KMC方法的Ag膜生长初期的计算机模拟[J].计算机技术与发展,2015,25(01):164-167.
 WU Pin[],SUN Jian-cheng[],ZHANG Hui-ru[]. Computer Simulation of Initial Growth of Ag Film Based on KMC[J].,2015,25(01):164-167.
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 基于KMC方法的Ag膜生长初期的计算机模拟()
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《计算机技术与发展》[ISSN:1006-6977/CN:61-1281/TN]

卷:
25
期数:
2015年01期
页码:
164-167
栏目:
应用开发研究
出版日期:
2015-01-10

文章信息/Info

Title:
 Computer Simulation of Initial Growth of Ag Film Based on KMC
文章编号:
1673-629X(2015)01-0164-04
作者:
 武频[1] 孙建城[1] 张慧茹[2]
 1.上海大学 计算机工程与科学学院;2.上海大学 材料学院 复合材料研究中心
Author(s):
 WU Pin[1] SUN Jian-cheng[1] ZHANG Hui-ru[2]
关键词:
 银薄膜生长蒙特卡洛方法嵌入式原子方法计算机模拟
Keywords:
 silver film growthKMC methodEAM computer simulation
分类号:
TP391.9
文献标志码:
A
摘要:
 文中针对银的晶格特征和银薄膜的生长特性,建立了基于KMC( Kinetic Monte Carlo)方法的银薄膜生长模型,模拟了单层Ag膜生长初期的表面形貌。在周期性基底且层间原子间采用交错排列的方式条件下,采用EAM( Embedded Atom Method)计算原子间作用势,并针对金属Ag的晶格特征及其成膜特性进行建模,编程,实验。实验结果表明:在温度不变的情况下,随着覆盖度的增加,表面原子的数量增多,且出现二维岛状生长;岛的生长形貌经历了从分散到凝聚生长的过程;原子岛的数量减少,同时岛的尺寸在增大。
Abstract:
 In this paper,aimed at the lattice characteristics of silver and silver film growth feature,the silver film growth model is set up based on KMC,surface morphology of monolayer Ag film is simulated. Under the condition of periodic basement and interlayer between atoms,use EAM ( Embedded Atom Method) to calculate the inter-atomic potential. According to the characteristics of the lattice of metal Ag and film-forming characteristic,carry out the modeling,programming,and experiment. The results show that in the case of constant temperature,with the increase of coverage, the number of surface atoms increases, and a two-dimensional island growth raises. The growth of the island morphology has experienced the process from scattered to the growth of the condensation. The number of atoms is-land is reduced,at the same time,the size of the island is increased.

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更新日期/Last Update: 2015-04-17